TSKgel® Phenyl-3PW (20) resin
TSKgel Phenyl-3PW (20) resin is a hydrophobic interaction chromatography (HIC) resin designed for oligonucleotide purification. This resin features phenyl group ligands functionalized on a 20 µm polymethacrylate base particle with 25 nm pores, which binds approximately 2.5 times more oligonucleotides than TSKgel Phenyl-5PW.
TSKgel Phenyl-3PW (20) resin efficiently purifies oligonucleotides with both DMT and MMT protection groups, ensuring high purity and yield. Its versatility reduces the need for multiple resins, streamlining processes for manufacturers and improving process economics.
TSKgel PW resins’ high degree of crosslinking results in high chemical and mechanical stability, allowing rigorous cleaning-in-place (CIP) and fast flow rates..
Structure of TOYOPEARL Phenyl-3PW (20) resin
Product attributes
| Base bead: |
3000PW |
| Pore size (mean): |
25 nm |
| Particle size (mean): |
20 µm |
| Ligand type: |
Phenyl |
| DBC: |
25-45 g/L |
| Shipping buffer: |
20% ethanol |
| pH stability: |
1-13 |
On-column Purification and DMT Cleavage (10 mg-oligo/mL-resin load)
 |
| Resin: |
TSKgel Phenyl-3PW (20)
|
| Column size: |
5 mm ID × 5 cm (1 mL) |
| Flow rate: |
1 mL/min (300 cm/hr) |
| Detection: |
UV @ 254 nm (mAU), pH |
| Temperature: |
ambient |
| Instrument: |
ÄKTA avant 25 (Unicorn 7.3) |
| Phase |
Mobile phase |
CV |
| Equilibration |
10 mmol/L NaOH,
1.0 mol/L (NH4)2SO4 |
10 |
| Load |
DMT-protected 20-mer,
20 mL @ 0.5 mg/mL
(10 mg-oligo / mL-resin) |
2 |
| Wash |
10 mmol/L NaOH,
1.0 mol/L (NH4)2SO4 |
5 |
| Cleavage |
200 mmol/L acetic acid, 1.0 mol/L (NH4)2SO4 |
10* |
|
| CIP1 |
water |
5 |
|
| CIP2 |
0.5 mol/L arginine |
5 |
|
*A pH 4.0 hold for 120 min was included after 2 CVs.
|